OSEQUE CYBER SHINE Oxygen Mask Cleanser

SONGHAK CO., LTD.
SONGHAK CO., LTD.

FULL PRESCRIBING INFORMATION

Active ingredient

Active ingredients: Niacinamide 0.2%, Glycerin 0.1%, Disodium EDTA 0.05%, Iron Oxides 0.005%

Purpose

Purpose: Skin Protectant

Inactive Ingredients: Water, Ammonium Lauryl Sulfate, Acrylates Copolymer, Cocamidopropyl Betaine, PEG-8, Cocamide DEA, Methyl Perfluorobutyl Ether, Methyl Perfluoroisobutyl Ether, PEG-7 Glyceryl Cocoate, Triethanolamine, Lithium Magnesium, Sodium Silicate, Trehalose, Lactose, Microcrystalline Cellulose, Sucrose, Zea Mays (Corn) Starch, Silk Powder, Emu Oil

Do not use: on wounds, rashes, dermatitis or damaged skin

Keep out of reach of children.  If swallowed, get medical help or contact a Poison Control Center immediately

Stop use: Please stop using this product and contact a dermatologist

1. If allergic reaction or irritation occurs

2. If direct sunlight affects the area as above

When using this product: Do not use other than directed

Warnings: For external use only.  Do not use other than directed

Direction:

Step 1. Spread evenly a proper amount on the waterless face (pump 5-6 times).  Surely, in order to create sufficient bubbles, use it with dry  hands

Step 2. Wait for oxygen bubble what generates bubble itself

Step 3. Do not rub strongly but massage gently with fingers for better cleansing

Step 4. Wash off with lukewarm water

Storage: Keep in a cool, dry place away from heat and direct sunlight